Tokyo Arts and Space (TOKAS), operated by a division of The Museum of Contemporary Art Tokyo, offers artist-in-residence programs for international creators working in various creative fields to stay, engage in creation, and conduct research activities in Tokyo.
International Creator Residency Program aims to invite distinguished and highly motivated creators in the field of visual art, film, design, and architecture from all over the world and offer them with opportunities to work in Tokyo. We provide financial support to allow creators to develop and present new works and ideas.
[Residency Period]
1.From the beginning of September, 2021 to the end of November, 2021
2.From the beginning of January, 2022 to the end of March, 2022
[Disciplines]
Visual art, film, design and architecture
[What TOKAS offers]
•Living space (with private bathroom and kitchen) and shared studio
•Airfare: A round-trip economy-class air ticket between the nearest airport from the place of residence and Tokyo (either Narita or Haneda Airport) will be provided.
•Living expenses (per diem): JPY3,500 (consumption tax excluded) per day
•Fee for work/project: JPY 300,000 (consumption tax excluded)
*Income tax will be deducted from the above amounts.
[Eligibility]
•Resides outside of Japan.
•Has 5 years or more of experience in his/her specialized area of expertise.
•Has sufficient ability to communicate in English with other residing creators and TOKAS staff for mutual understanding.
•Independent and capable of working and living on his/her own.
•Creators working as a duo are also eligible. (A duo consisting of at least one creator residing outside of Japan is eligible.)
•Students are ineligible (except for Ph.D. candidates).
[How to Apply]
Download the "Outline" and "Application Package" from the link below and send all materials to TOKAS Residency.
https://www.tokyoartsandspace.jp/en/archive/application/2020/20200513-223.html" target="_blank">https://www.tokyoartsandspace.jp/en/archive/application/2020/20200513-223.html
[Application Deadline]
Deadline for application (documents): June 24 (Wed), 2020, 18:00 (JST)
Deadline for application (materials): July 1 (Wed), 2020, 18:00 (JST